Temescal BJD-1800 3-Cathode Sputter System, System Specs: (see picture). Excellent condition.  The system was fully operational prior to deinstallation in a Fab in Silicon Valley.
This system is configured with a low volume load lock mounted on top of the process chamber. The load lock consists of a gate valve, adapter flange and motorized linear motion assembly. The 7 .5" substrate table assembry is mounted within this low volume adapter.
Two of the three cathodes are configured for RF magnetron co-sputtering and the third cathode is configured for DC magnetron sputtering. The system has one 7" diameter rotating substrate stage capable of 5 to 100 RPM, and the stage has 300 watt RF biasing capability. This can also be used for etching the substrate. The system is configured for downmeam pressure control. The software program will run a complete recipe automatically, giving the customer a repeatable process every time.
Price Term: AS IS,WHERE IS
Options: We can also sell it at extra cost at (1) Complete, Working, functional test; (2) Refurbished condition with warranty . Pls contact us for detail. Appreciate your time