Oxford Plasmalab System 133 RIE-SN417729
2004 Oxford Plasmalab System 133+ RIE FL Reactive Ion Etcher
OXFORD Plasmalab 133 RIE (FL) For Sale
Model Year : 2004
Quantity : 1
Condition : Complete system
Serial No : 417729
Availability : ImmediateConfiguration:
Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for SiO2 Etch
RF Generator: Advanced Energy RFX 600A ; 600W, 13.56MHz,
Chamber Turbo pump: Alcatel ATH 400M w/ ACT 600M controller
Blue color PLC typeWater cooled electrode 10C-80C
Gas pod with 6 lines including following MFCs:
Ar – 100sccm
N2 – 200sccm
CHF3 – 200sccm
NF3 – 200sccm
N2O – 200sccmWindows PC, user friendly interface
The price is at AS IS,WHERE IS condition without warranty. We can sell it at complete, working, functional test or Refurbished condition at extra cost if necessary.
Contact us for more photos.