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Oxford Plasmalab System 133 RIE-SN417729

Oxford Plasmalab System 133 RIE-SN417729

2004 Oxford Plasmalab System 133+ RIE FL Reactive Ion Etcher

OXFORD Plasmalab 133 RIE (FL) For Sale

Model Year : 2004
Quantity :    1
Condition : Complete system
Serial No : 417729
Availability : Immediate

Configuration:
Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for SiO2 Etch
RF Generator:  Advanced Energy RFX 600A ;  600W, 13.56MHz,
Chamber Turbo pump: Alcatel ATH 400M  w/ ACT 600M controller
Blue color PLC type

Water cooled electrode 10C-80C

Gas pod with 6 lines including following MFCs:
Ar      – 100sccm
N2     – 200sccm
CHF3 – 200sccm
NF3   – 200sccm
N2O  – 200sccm

Windows PC, user friendly interface

The price is at AS IS,WHERE IS condition without warranty. We can sell it at complete, working, functional test or Refurbished condition at extra cost if necessary.

Contact us for more photos.

    $98,000.00Price
    Quantity
    Product Page: Stores_Product_Widget

    All the used equipment  rights and trade mark belong to the OEM.All the items at this website are subject to prior sale without notice. The price and terms at the website are only for your reference. We will provide an official quotation with terms via email for each deal. Appreciate your time! We can't accept online orders right now  Please contact us to complete your purchase

    ©2021 by SemiSar Corp.

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