Oxford Plasmalab System 133 RIE-SN417728

2004 Oxford Plasmalab 133+ RIE CL Reactive Ion Etcher
OXFORD Plasmalab 133 RIE (CL)
Model Year : 2004
Quantity : 1
Condition : Complete system
Serial No : 417728
Availability : immediate
Configuration:
Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for GaN Etch
RF Power: 600W, 13.56MHz
Water cooled electrode 10C-80C
End point detection: Verity Optical emission spectroscopy (200-800nm)
Gas pod with 6 lines including following MFCs:
Ar – 100sccm
CL – 100sccm
BCL3 – 100sccm
N2O – 100sccm
Windows PC, user friendly interface
The price is at AS IS,WHERE IS condition without warranty. We can sell it at complete, working, functional test or Refurbished condition at extra cost if necessary.
Contact us for more photos.