Oxford PlasmaLab System 133 RIE-SN417718

2003 Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher
OXFORD Plasmalab 133 RIE (CL)
Model Year : 2003
Quantity :    1
Condition : Complete system
Serial No : 417718
Configuration:
Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for GaN Etch
RF Power: 600W, 13.56MHz
Water cooled electrode 10C-80C
Load Lock with turbo pump
End point detection: Verity Optical emission spectroscopy (200-800nm)
Gas pod with 6 lines including following MFCs:
Ar      – 100sccm
CL     – 100sccm
BCL3 – 100sccm
N2O   – 100sccm
Windows PC, User friendly interface
The price is at AS IS,WHERE IS condition without warranty. We can sell it at complete, working, functional test or Refurbished condition at extra cost if necessary.
Contact us for more photos.